The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
Oct. 17, 2014
Applicant:
Skyworks Solutions, Inc., Woburn, MA (US);
Inventors:
Steve Canale, Simi Valley, CA (US);
David James Zapp, Simi Valley, CA (US);
Assignee:
Skyworks Solutions, Inc., Woburn, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23Q 1/00 (2006.01); H01L 21/02 (2006.01); B23Q 3/08 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02076 (2013.01); B23Q 3/084 (2013.01); H01L 21/6838 (2013.01); H01L 21/68735 (2013.01); Y10S 269/90 (2013.01); Y10S 269/903 (2013.01); Y10T 428/21 (2015.01);
Abstract
Disclosed are devices and methodologies for cleaning wafers in wafer processing operations such as solvent cleaning. In an example situation, a wafer that has been separated from a support plate can be cleaned. The wafer still needs to be handled carefully during such a cleaning operation. Various devices and methodologies that facilitate efficient handling of wafers and solvent cleaning operations are disclosed.