The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
May. 05, 2015
Applicant:
Zhongao Huicheng Technology Co., Ltd., Beijing, CN;
Inventors:
Gong Jin, Beijing, CN;
Jiangping Tu, Beijing, CN;
Lingling Li, Beijing, CN;
Gang Wang, Beijing, CN;
Meina Wang, Beijing, CN;
Assignee:
ZhongAo HuiCheng Technology Co., Ltd., Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3417 (2013.01); H01J 37/3429 (2013.01); H01J 37/3447 (2013.01); H01J 37/3411 (2013.01);
Abstract
A magnetron sputtering coating device includes a deposition chamber, sputtering cathodes, a rotating stand within the deposition chamber, a support platform on the rotating stand, a first rotation system for driving the rotating stand to rotate around a central axis of the rotating stand, and a baffle fixed on the rotating stand. The sputtering cathodes are arranged around and perpendicular to the rotating stand.