The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
Dec. 16, 2014
Applicant:
Exogenesis Corporation, Billerica, MA (US);
Inventors:
Sean R. Kirkpatrick, Littleton, MA (US);
Allen R. Kirkpatrick, Carlisle, MA (US);
Michael J. Walsh, Billerica, MA (US);
Richard C. Svrluga, Cambridge, MA (US);
Assignee:
Exogenesis Corporation, Billerica, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/05 (2006.01); H01J 37/317 (2006.01); H01J 37/08 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3171 (2013.01); H01J 37/05 (2013.01); H01J 37/08 (2013.01); H01J 37/147 (2013.01); H01J 37/317 (2013.01); H01J 2237/0041 (2013.01); H01J 2237/0812 (2013.01); H01J 2237/15 (2013.01); H01J 2237/31701 (2013.01); Y10T 428/24355 (2015.01); Y10T 428/24479 (2015.01); Y10T 428/30 (2015.01);
Abstract
A method of improving the surface of an object treats the surface with a neutral beam formed from a gas cluster ion mean to create a surface texture and/or increase surface area.
Kirkpatrick, Sean. (2017). Method and apparatus for neutral beam processing based on gas cluster ion beam technology (U.S. Patent No. 9799488). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9799488
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile