The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Oct. 27, 2011
Applicants:

Ruopeng Liu, Shenzhen, CN;

Lin Luan, Shenzhen, CN;

Chaofeng Kou, Shenzhen, CN;

Fanglong He, Shenzhen, CN;

Zhiya Zhao, Shenzhen, CN;

Jincai YE, Shenzhen, CN;

Inventors:

Ruopeng Liu, Shenzhen, CN;

Lin Luan, Shenzhen, CN;

Chaofeng Kou, Shenzhen, CN;

Fanglong He, Shenzhen, CN;

Zhiya Zhao, Shenzhen, CN;

Jincai Ye, Shenzhen, CN;

Assignee:

KUANG-CHI INNOVATIVE TECHNOLOGY LTD., Shenzhen, Guangdong, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 1/00 (2006.01); H01Q 15/08 (2006.01); H01Q 15/10 (2006.01); H01Q 15/00 (2006.01);
U.S. Cl.
CPC ...
H01F 1/00 (2013.01); H01Q 15/0086 (2013.01); H01Q 15/08 (2013.01); H01Q 15/10 (2013.01);
Abstract

The present invention provides an artificial electromagnetic material, comprising at least one material sheet layer; wherein each material sheet layer is provided with a first substrate and a second substrate which are oppositely arranged; and a plurality of artificial microstructures are attached on a surface, facing the second substrate, of the first substrate. The first substrate and the second substrate on both sides of the artificial microstructure are in such tight contact therewith that the number of electric field lines passing through the substrates is increased and the equivalent permittivity of the artificial electromagnetic material is effectively improved.


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