The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
May. 17, 2017
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Hiromi Kobayashi, Haibara-gun, JP;
Haruki Inabe, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C07C 69/54 (2006.01); H01L 21/027 (2006.01); C08F 220/26 (2006.01); C08F 220/22 (2006.01); C08F 214/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 69/54 (2013.01); C08F 214/18 (2013.01); C08F 220/22 (2013.01); C08F 220/26 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); H01L 21/0274 (2013.01); Y10S 430/106 (2013.01); Y10S 430/114 (2013.01); Y10S 430/146 (2013.01);
Abstract
A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.