The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Jun. 17, 2014
Applicant:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Inventors:

Edward Nabighian, San Jose, CA (US);

Alan Martin, San Jose, CA (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 11/00 (2006.01); G02B 13/00 (2006.01); G02B 15/00 (2006.01); G02B 25/00 (2006.01); G02B 3/00 (2006.01); G02B 7/00 (2006.01); G02B 9/00 (2006.01); G02B 7/02 (2006.01); B29C 33/00 (2006.01); B29L 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 13/0085 (2013.01); G02B 7/022 (2013.01); B29C 33/0055 (2013.01); B29L 2011/0016 (2013.01);
Abstract

Wafer-level optical elements and the concave spacer-wafer apertures in which they are formed are disclosed. The wafer-level optical elements include a spacer wafer comprising a plurality of apertures. Each aperture has a concave shape in a planar cross-section of the spacer wafer and an overflow region intersecting the planar cross-section. The wafer-level optical elements also include an array of optical elements, each optical element of the array being formed of cured flowable material within a respective one of the plurality of apertures. A portion of the cured flowable material forming each optical element extends into the overflow region of the respective aperture of the plurality of apertures. The spacer wafer includes a plurality of apertures, each of the plurality of apertures having a concave shape in a planar cross-section of the spacer wafer. Each of the plurality of apertures includes an overflow region intersecting the planar cross-section.


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