The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Nov. 20, 2014
Applicant:

Fujifilm Corporation, Minato-ku, Tokyo, JP;

Inventors:

Hirotaka Kitagawa, Haibara-gun, JP;

Akiko Hattori, Haibara-gun, JP;

Yuichiro Enomoto, Haibara-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/32 (2006.01); G03F 7/00 (2006.01); B29C 59/00 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); H01L 21/02 (2006.01); B29K 33/00 (2006.01);
U.S. Cl.
CPC ...
C08F 220/32 (2013.01); B29C 59/005 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); G03F 7/0002 (2013.01); H01L 21/02356 (2013.01); B29K 2033/12 (2013.01); C08F 2220/281 (2013.01); C08F 2220/325 (2013.01);
Abstract

An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).


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