The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Oct. 02, 2015
Applicant:

Saint-gobain Ceramics & Plastics, Inc., Worcester, MA (US);

Inventors:

Olivier Citti, Wellesley, MA (US);

Andrea L. Kazmierczak, Marlborough, MA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/10 (2006.01); C04B 35/101 (2006.01); C03B 17/06 (2006.01); C04B 35/111 (2006.01); C04B 35/117 (2006.01); C04B 35/443 (2006.01); C04B 35/626 (2006.01);
U.S. Cl.
CPC ...
C04B 35/10 (2013.01); C03B 17/064 (2013.01); C04B 35/1015 (2013.01); C04B 35/111 (2013.01); C04B 35/117 (2013.01); C04B 35/443 (2013.01); C04B 35/62665 (2013.01); C04B 2235/3206 (2013.01); C04B 2235/3231 (2013.01); C04B 2235/3232 (2013.01); C04B 2235/3251 (2013.01); C04B 2235/3262 (2013.01); C04B 2235/3272 (2013.01); C04B 2235/3281 (2013.01); C04B 2235/3418 (2013.01); C04B 2235/3463 (2013.01); C04B 2235/3813 (2013.01); C04B 2235/3839 (2013.01); C04B 2235/5409 (2013.01); C04B 2235/5436 (2013.01); C04B 2235/5445 (2013.01); C04B 2235/5472 (2013.01); C04B 2235/77 (2013.01); C04B 2235/9692 (2013.01);
Abstract

A refractory object can include at least 10 wt % AlO. Further, the refractory object may contain less than approximately 6 wt % SiOor may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the AlOin the refractory object can be provided as reactive AlO. In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.


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