The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
Feb. 07, 2014
Applicant:
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Inventors:
Heinz Fabian, Grossostheim, DE;
Stephan Thomas, Grosskrotzenburg, DE;
Assignee:
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 19/14 (2006.01); C03C 3/06 (2006.01);
U.S. Cl.
CPC ...
C03B 19/1415 (2013.01); C03B 19/14 (2013.01); C03C 3/06 (2013.01); C03B 2201/12 (2013.01); C03B 2201/42 (2013.01); C03B 2207/32 (2013.01); C03B 2207/34 (2013.01); C03C 2201/42 (2013.01); C03C 2203/40 (2013.01);
Abstract
A method for producing titanium-doped synthetic quartz glass includes: The liquid SiOfeedstock material comprises at least one additional component made of the polyalkylsiloxane D3 having a weight fraction of mD3 and one additional component made of the polyalkylsiloxane D5 having a weight fraction of mD5 at a weight ratio of mD3/mD5 in a range of 0.01 to 1, and the liquid SiOfeedstock material provided is evaporated while maintaining the weight ratio of mD3/mD5 and at least 99% by weight thereof are evaporated to form the gaseous SiOfeedstock vapor.