The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

Aug. 17, 2016
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Michael Hutzler, Villach, AT;

Georg Ehrentraut, Villach, AT;

Matthias Kuenle, Villach, AT;

Ralf Siemieniec, Villach, AT;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/40 (2006.01); H01L 29/36 (2006.01); H01L 29/423 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7397 (2013.01); H01L 29/1095 (2013.01); H01L 29/36 (2013.01); H01L 29/407 (2013.01); H01L 29/4236 (2013.01); H01L 29/66348 (2013.01);
Abstract

A semiconductor device includes a drift region extending from a first surface into a semiconductor portion. A body region between two portions of the drift region forms a first pn junction with the drift region. A source region forms a second pn junction with the body region. The pn junctions include sections perpendicular to the first surface. Gate structures extend into the body regions and include a gate electrode. Field plate structures extend into the drift region and include a field electrode separated from the gate electrode. A gate shielding structure is configured to reduce a capacitive coupling between the gate structures and a backplate electrode directly adjoining a second surface.


Find Patent Forward Citations

Loading…