The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9793304 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 17, 2017

Filed:

Apr. 20, 2016
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;

Inventors:

Zhenfei Cai, Beijing, CN;

Zhengwei Chen, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1296 (2013.01); C23C 14/352 (2013.01); H01L 27/124 (2013.01);
Abstract

A method for producing an array substrate is provided. The method includes: forming metal film layers and patterning the metal film layers to form a plurality rows of gate lines and a plurality columns of data lines crossed to each other in the non-display area and forming thin film transistors; forming a pad part at one end of the gate lines or data lines. The process of producing the pad part includes: forming a first insulation layer on the metal film layers by patterning; forming an etching protection layer, a source and drain metal layer and a second insulation layer sequentially by patterning, wherein the first insulation layer, the etching protection layer, the source and drain metal layer and the second insulation layer form a trapezoid stack.


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