The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2017
Filed:
Apr. 27, 2016
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Kasun Anupama Punchihewa, Ballstron Lake, NY (US);
Jagar Singh, Clifton Park, NY (US);
Assignee:
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/265 (2006.01); H01L 27/06 (2006.01); H01L 21/8234 (2006.01); H01L 29/66 (2006.01); H01L 29/861 (2006.01); H01L 27/08 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0629 (2013.01); H01L 21/26513 (2013.01); H01L 21/823431 (2013.01); H01L 27/0814 (2013.01); H01L 29/0649 (2013.01); H01L 29/0657 (2013.01); H01L 29/66136 (2013.01); H01L 29/861 (2013.01);
Abstract
A method includes forming a first plurality of fins having a first width in a first region of a semiconductor substrate. A second plurality of fins having a second width greater than the first width is formed in a second region of a semiconductor substrate. A doped region is formed in a surface portion of the second plurality of fins to define an anode region of a diode. A junction is defined between the doped region and a cathode region of the second plurality of fins. A first contact interfacing with the anode region is formed.