The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2017
Filed:
Mar. 10, 2016
Kabushiki Kaisha Toshiba, Tokyo, JP;
Keisuke Nakazawa, Mie, JP;
Toshiba Memory Corporation, Tokyo, JP;
Abstract
A spin coating method according to an embodiment includes forming a first material film on an underlying material. The underlying material is rotated while a solution of a second material film is supplied onto an upper surface of the first material film to make the solution stay on the upper surface of the first material film. Rotating of the underlying material is stopped or a rotational speed of the underlying material is reduced to 10 rpm or less. The underlying material is rotated after a first period elapses after the stopping of the rotating of the underlying material, or the rotational speed of the underlying material is increased after the first period elapses after the reducing of the rotational speed of the underlying material to spin off the solution from the upper surface of the first material film.