The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

Jun. 17, 2016
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Daisuke Morita, Tokyo, JP;

Hiroyuki Kawahara, Tokyo, JP;

Shinji Kimura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01J 37/304 (2006.01); H01S 5/0625 (2006.01); H01S 5/343 (2006.01); H01S 5/40 (2006.01); H01S 5/00 (2006.01); H01J 37/305 (2006.01); H01S 5/026 (2006.01); H01S 5/12 (2006.01); H01J 37/302 (2006.01); H01S 5/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/304 (2013.01); H01J 37/3026 (2013.01); H01J 37/3053 (2013.01); H01J 37/3056 (2013.01); H01S 5/0014 (2013.01); H01S 5/0265 (2013.01); H01S 5/06256 (2013.01); H01S 5/12 (2013.01); H01S 5/3434 (2013.01); H01S 5/34313 (2013.01); H01S 5/34326 (2013.01); H01S 5/4087 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/30472 (2013.01); H01J 2237/3174 (2013.01); H01S 5/3054 (2013.01); H01S 5/34306 (2013.01); H01S 2301/173 (2013.01);
Abstract

A semiconductor device manufacturing system includes: a PL evaluation apparatus that evaluates wavelengths of photoluminescent light produced by individual optical modulators on a single semiconductor wafer; an electron beam drawing apparatus that draws patterns of diffraction gratings of laser sections that adjoin respective optical modulators on the wafer; and a calculation section that receives the wavelengths of the photoluminescent light from the PL evaluation apparatus, calculates densities of respective diffraction gratings so that differences between the wavelengths of the photoluminescent light and oscillating wavelengths of the laser sections become a constant, and sends the densities calculated to the electron beam drawing apparatus for drawing respective diffraction grating patterns on the respective laser sections.


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