The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

Nov. 22, 2010
Applicants:

Kyeu-yoon Sheem, Yongin-si, KR;

Bok-hyun Ka, Yongin-si, KR;

Eui-hwan Song, Yongin-si, KR;

Jung-woo an, Yongin-si, KR;

Inventors:

Kyeu-Yoon Sheem, Yongin-si, KR;

Bok-Hyun Ka, Yongin-si, KR;

Eui-Hwan Song, Yongin-si, KR;

Jung-Woo An, Yongin-si, KR;

Assignee:

Samsung SDI Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 4/583 (2010.01); H01M 4/88 (2006.01); H01G 4/30 (2006.01); H01G 11/32 (2013.01); H01M 10/34 (2006.01); H01M 10/48 (2006.01);
U.S. Cl.
CPC ...
H01G 11/32 (2013.01); H01M 10/345 (2013.01); H01M 10/482 (2013.01); Y02E 60/13 (2013.01);
Abstract

A crystalline carbonaceous material with a controlled interlayer spacing and a method of manufacturing the same. In one embodiment, a crystalline carbonaceous material has a layered structure including a plurality of layers and where a filler is present between the layers. The layers with the filler have an interlayer spacing d002 at a (002) plane, and the interlayer spacing d002 is at or between 0.335 nm and 1 nm when its X-ray diffraction is measured using a CuKα ray.


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