The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

May. 31, 2012
Applicants:

Kei Shinada, Uji, JP;

Shigeyoshi Horiike, Uji, JP;

Takahiro Nishimoto, Kyoto, JP;

Inventors:

Kei Shinada, Uji, JP;

Shigeyoshi Horiike, Uji, JP;

Takahiro Nishimoto, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/62 (2006.01); G01N 30/64 (2006.01); G01N 27/70 (2006.01); G01R 19/00 (2006.01);
U.S. Cl.
CPC ...
G01N 27/62 (2013.01); G01N 27/70 (2013.01); G01N 30/64 (2013.01); G01R 19/0061 (2013.01);
Abstract

A low-OH-content quartz glass with an OH content equal to or lower than 5 ppm is used as a cylindrical tube () covering the surface of metallic plasma generation electrodes (and) for generating a low-frequency barrier discharge. It has been found that, in the low-frequency barrier discharge, hydrogen and oxygen originating from the OH contained in a dielectric material are released into plasma gas for a long period of time, constituting a primary cause of an increase in the baseline current. The use of a low-OH-content quartz glass dramatically lowers the baseline current and thereby improves the S/N ratio and the detection limit.


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