The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

May. 22, 2015
Applicant:

Wistron Neweb Corp., Hsinchu, TW;

Inventors:

Tzu-Wen Chuang, Hsinchu, TW;

Babak Radi, Hsinchu, TW;

Shih-Hong Chen, Hsinchu, TW;

Chun-Lin Chen, Hsinchu, TW;

Assignee:

Wistron NeWeb Corp., Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/09 (2006.01); C25D 5/34 (2006.01); H05K 3/38 (2006.01);
U.S. Cl.
CPC ...
C25D 5/34 (2013.01); H05K 3/384 (2013.01); H05K 3/387 (2013.01); H05K 3/389 (2013.01);
Abstract

A manufacturing method of a substrate structure including the following steps is provided. A chemical surface treatment is performed on a metal base such that a passivation layer is formed on a surface of the metal base. The metal base is assembled to a substrate. A metal pattern is formed on the substrate, wherein the metal pattern is separated from the metal base. A substrate structure and a metal component are also provided.


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