The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

Jan. 08, 2016
Applicant:

The United States of America As Represented BY the Secretary of the Air Force, Washington, DC (US);

Inventors:

Timothy S. Haddad, Lancaster, CA (US);

Joseph M. Mabry, Lancaster, CA (US);

Sean Ramirez, Lancaster, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07F 7/21 (2006.01); B05D 3/12 (2006.01); C09D 5/16 (2006.01); B05D 5/08 (2006.01); C09D 7/12 (2006.01); C08K 5/549 (2006.01);
U.S. Cl.
CPC ...
C09D 5/1662 (2013.01); B05D 5/083 (2013.01); C07F 7/21 (2013.01); C09D 7/1233 (2013.01); C08K 5/549 (2013.01);
Abstract

A method of manufacturing a fluorinated polyhedral oligomeric silsesquioxane. The method for manufacture includes opening a single edge of a closed-cage F-POSS and bridging the opened, single edge with a sulfate group. The sulfate group is converted to a disilanol, which is then reacted with a functional dichlorosilane having an organic functional group comprising at least three carbon atoms.


Find Patent Forward Citations

Haddad, Timothy. (2017). Synthesis of functional fluorinated polyhedral oligomeric silsesquioxane ('f-poss') (U.S. Patent No. 9790377). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9790377

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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