The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2017
Filed:
Dec. 25, 2013
Applicant:
Rohm and Haas Company, Philadelphia, PA (US);
Inventors:
Han Liu, Shanghai, CN;
Xiangting Dong, Shanghai, CN;
Qingwei Zhang, Shanghai, CN;
Tao Wang, Shanghai, CN;
Assignee:
Rohm and Haas Company, Collegeville, PA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09D 5/16 (2006.01); C08G 61/02 (2006.01); C08G 61/04 (2006.01); C09D 5/14 (2006.01); C08L 33/06 (2006.01); C09D 133/06 (2006.01); C09J 133/06 (2006.01); C09D 179/06 (2006.01); C09D 5/02 (2006.01); C08F 4/40 (2006.01);
U.S. Cl.
CPC ...
C09D 5/14 (2013.01); C08L 33/06 (2013.01); C09D 5/025 (2013.01); C09D 133/06 (2013.01); C09D 179/06 (2013.01); C09J 133/06 (2013.01); C08F 4/40 (2013.01);
Abstract
Provided is a process for forming an antimicrobial polymer composition comprising: contacting together at least one initiator, at least one promoter, at least one reductant, and at least one monomer, under emulsion polymerization conditions to form a base polymer; and mixing with the base polymer an antimicrobial complex; wherein the at least one initiator is a peroxidic compound and the at least one reductant is an ascorbic compound.