The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2017
Filed:
Jun. 02, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Yoshinao Ogata, Fukushima, JP;
Seiko Minami, Warabi, JP;
Masataka Kato, Hiratsuka, JP;
Masaya Uyama, Kawasaki, JP;
Toshiyasu Sakai, Kawasaki, JP;
Hiroshi Higuchi, Atsugi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A method of forming a through-substrate having a first surface and a second surface opposite to the first surface, the method causing the first surface to communicate with the second surface through the substrate, the method including: a first step that forms a first trench from the first surface side of the substrate using dry etching, the first trench having side surfaces on which protective film is formed; and a second step that forms a second trench from the second surface side using dry etching, the second trench communicating with the first trench having the side surfaces on which the protective film is formed.