The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2017

Filed:

Mar. 15, 2016
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Junji Kobayashi, Minamiminowa, JP;

Jun Nishide, Ina, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03B 5/32 (2006.01); H03H 9/17 (2006.01); H03H 9/19 (2006.01); H03B 5/36 (2006.01); H03H 9/02 (2006.01); H03H 9/05 (2006.01); H03H 9/08 (2006.01); H03H 9/10 (2006.01); H03H 9/13 (2006.01);
U.S. Cl.
CPC ...
H03H 9/17 (2013.01); H03B 5/36 (2013.01); H03H 9/02102 (2013.01); H03H 9/0519 (2013.01); H03H 9/0542 (2013.01); H03H 9/0547 (2013.01); H03H 9/0552 (2013.01); H03H 9/08 (2013.01); H03H 9/1014 (2013.01); H03H 9/13 (2013.01); H03H 9/19 (2013.01);
Abstract

A resonator element includes a substrate having a first region performing thickness shear vibration, a second region located in a periphery of the first region and having a smaller thickness than the first region, a fixed end, and a free end opposite to the fixed end in the first region in a plan view. Excitation electrodes are disposed on a front and a rear of the first region and have regions overlapping each other in the plan view. A center of the first region and a center of the regions overlapping each other are located between a center of the substrate and the free end in the plan view. When Cs is a distance between the center of the regions overlapping each other and the center of the substrate in the plan view, a relation of 105 μm<Cs<130 μm is satisfied.


Find Patent Forward Citations

Loading…