The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Nov. 27, 2015
Epistar Corporation, Hsinchu, TW;
Huga Optotech Inc., Taichung, TW;
Shang-Ju Tu, Taichung, TW;
EPISTAR CORPORATION, Hsinchu, TW;
Abstract
Disclosure includes a normally-off field-effect semiconductor device and the fabrication method thereof. An antigrowth portion is formed on a template. A first semiconductor layer and a second semiconductor layer on the template form two heterojunctions for creating two-dimensional electron gas regions, while a heterojunction-free area defined by the antigrowth portion separate the heterojunctions. A dielectric layer is on the second semiconductor layer and above the antigrowth portion. Two channel electrodes formed on the second semiconductor layer are electrically coupled to the two-dimensional electron gas regions respectively. A gate electrode on the dielectric layer and above the antigrowth portion is used for control of conduction between the channel electrodes.