The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2017

Filed:

Jul. 14, 2015
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Katsuyuki Sekine, Yokkaichi, JP;

Masaaki Higuchi, Yokkaichi, JP;

Masao Shingu, Yokkaichi, JP;

Hirokazu Ishigaki, Yokkaichi, JP;

Naoki Yasuda, Mie, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); H01L 29/51 (2006.01); H01L 21/02 (2006.01); H01L 27/1157 (2017.01); H01L 27/11575 (2017.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); H01L 21/0214 (2013.01); H01L 21/0217 (2013.01); H01L 21/0223 (2013.01); H01L 27/1157 (2013.01); H01L 27/11575 (2013.01); H01L 29/511 (2013.01); H01L 29/518 (2013.01);
Abstract

According to an embodiment, a nonvolatile semiconductor memory device comprises a plurality of conductive layers stacked in a first direction via an inter-layer insulating layer. In addition, the nonvolatile semiconductor memory device comprises: a semiconductor layer having the first direction as a longer direction; a tunnel insulating layer contacting a side surface of the semiconductor layer; a charge accumulation layer contacting a side surface of the tunnel insulating layer; and a block insulating layer contacting a portion facing the conductive layer, of a side surface of the charge accumulation layer. Moreover, the portion facing the conductive layer, of the charge accumulation layer is thinner compared to a portion facing the inter-layer insulating layer, of the charge accumulation layer.


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