The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Nov. 25, 2015
Applicant:
Stmicroelectronics S.r.l., Agrate Brianza, IT;
Inventors:
Dario Tenaglia, Gravina di Catania, IT;
Sebastiano Cali, Ramacca, IT;
Assignee:
STMICROELECTRONICS S.R.L., Agrate Brianza, IT;
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 3/10 (2006.01); H01L 21/306 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); B08B 3/02 (2013.01); B08B 3/10 (2013.01); H01L 21/02068 (2013.01); H01L 21/30604 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/67086 (2013.01); H01L 21/67703 (2013.01);
Abstract
An apparatus for processing semiconductor wafers includes at least a wet bench and an automatic handling system of a wafer carrier removably connected thereto. The wet bench includes a first processing tank, a second processing tank and a third processing tank, separated from one another, each processing tank being dedicated to a different chemical, as well as a special cleaning and drying tank for processing the automatic handling system when the wafer carrier has been removed.