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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9786472 B1

PDFFull Text
Date of Patent:
Oct. 10, 2017

Filed:

Oct. 02, 2015

Plasma processing apparatus and method for manufacturing electronic component

Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Tetsuhiro Iwai, Osaka, JP;

Shogo Okita, Hyogo, JP;

Syouzou Watanabe, Osaka, JP;

Assignee:

PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD., Osaka, JP;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Allan Olsen

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); C23C 16/4586 (2013.01); C23C 16/466 (2013.01); C23C 16/50 (2013.01); H01J 37/321 (2013.01); H01J 37/32724 (2013.01); H01L 21/67109 (2013.01); H01L 21/67132 (2013.01); H01L 21/6831 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01L 21/68785 (2013.01);
Abstract

A plasma processing apparatus performs plasma processing on a substrate held by a carrier. The carrier includes a frame disposed around the substrate and a holding sheet which holds the substrate and the frame. The plasma processing apparatus includes: a chamber; a stage which is disposed within the chamber and has an upper surface on which the carrier is mounted; a gas hole which is provided at a position of the upper surface opposing a bottom surface of the frame and through which cooling gas is supplied between the stage and the carrier; and a plasma exciting unit which generates plasma within the chamber.

Find Patent Forward Citations

Iwai, Tetsuhiro. (2017). Plasma processing apparatus and method for manufacturing electronic component (U.S. Patent No. 9786472). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9786472

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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