The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Dec. 31, 2014
Applicant:
Kyungpook National University Industry-academic Cooperation Foundation, Daegu, KR;
Inventors:
Byung In Moon, Daegu, KR;
Kyeong Ryeol Bae, Daegu, KR;
Hyeon Sik Son, Daegu, KR;
Seung Ho Ok, Busan, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 13/00 (2006.01); G06T 7/593 (2017.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
G06T 7/593 (2017.01); H01J 37/222 (2013.01); H01J 2237/226 (2013.01); H01J 2237/2611 (2013.01); H04N 2013/0081 (2013.01);
Abstract
Provided is a method of computing precise disparity using a stereo matching method based on developed census transform with an adaptive support weight method in area based stereo matching. The method includes a step of setting an adaptive support weight window centered on a specific point of a left image and setting adaptive support weight windows with the same size with respect to one point positioned within a maximum disparity prediction value about a specific point of the left image in a right image.