The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Mar. 31, 2016
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
W. Thomas Novak, Redwood City, CA (US);
Andrew J. Hazelton, San Carlos, CA (US);
Douglas C. Watson, Campbell, CA (US);
Assignee:
NIKON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01);
Abstract
A liquid immersion lithography apparatus includes a projection system including an optical member of which an incidence side has a convex lens shape, the projection system being configured to project an image through a liquid on a workpiece, and a liquid immersion member arranged below the optical member, the liquid immersion member having a plurality of openings through which the liquid is allowed to flow. A material of which the optical member is made is more resistant to the liquid than a material of which the liquid immersion member is made.