The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
May. 25, 2015
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, CN;
Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, CN;
Xiaojiang Yu, Shenzhen, CN;
Haibo Du, Shenzhen, CN;
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., Shenzhen, Guangdong, CN;
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., Wuhan, Hubei, CN;
Abstract
The present invention provides an array substrate structure and a manufacturing method thereof, in which after a common electrode () is formed, a reduction resistant layer () is first formed on the common electrode () before deposition of a second insulation layer () in order to prevent the film quality of the common electrode () from being affected by a reductive atmosphere generated in a process of directly depositing the second insulation layer () on the common electrode () thereby reducing the influence on the transmittal of the common electrode () caused by the deposition of the second insulation layer () on the common electrode () and providing the common electrode () with increased transmittal and enhancing displaying performance.