The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Mar. 13, 2015
Ya-ling Hsu, Hsinchu, TW;
Li-chiu Tsai, Hsinchu, TW;
Chi-chang Tien, Hsinchu, TW;
Yi-hsueh Chen, Hsinchu, TW;
Ya-Ling Hsu, Hsinchu, TW;
Li-Chiu Tsai, Hsinchu, TW;
Chi-Chang Tien, Hsinchu, TW;
Yi-Hsueh Chen, Hsinchu, TW;
Young Optics Inc., Hsinchu, TW;
Abstract
A wide-angle projection system includes a refraction unit and a reflection unit. The refraction unit includes a first lens group of positive refractive power and a second lens group of negative refractive power. The second lens group is disposed between the first lens group and the reflection unit and the condition: 0.9<A/B<1.4 is satisfied, where A denotes a distance along an optical axis of the wide-angle projection system and between the refraction unit and the reflection unit, and B denotes a total length of the refraction unit along the optical axis.