The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2017

Filed:

Jun. 08, 2015
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Jaeseung Chung, Suwon-si, KR;

Dongouk Kim, Pyeongtaek-si, KR;

Joonyong Park, Suwon-si, KR;

Jihyun Bae, Seoul, KR;

Bongsu Shin, Seoul, KR;

Sunghoon Lee, Seoul, KR;

Sukgyu Hahm, Gyeongju-si, KR;

Jong G. Ok, Seoul, KR;

Ilsun Yoon, Seongnam-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G03F 7/00 (2006.01); B29D 11/00 (2006.01); B29K 101/10 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3058 (2013.01); B29D 11/00644 (2013.01); G03F 7/0002 (2013.01); B29K 2101/10 (2013.01);
Abstract

A pattern structure includes a plurality of pattern structure units arranged substantially on a same plane, where each of the pattern structure units has a first surface and a second surface, which are opposite to each other, and a microstructure is defined on the first surface of each of the pattern structure units, and a flattening layer disposed on the second surface of each of the plurality of pattern structure units, where the flattening layer connects the pattern structure units with each other, and a vertical step difference exists between second surfaces of the pattern structure units.


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