The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Nov. 08, 2013
Kao Corporation, Tokyo, JP;
KAO CORPORATION, Tokyo, JP;
Abstract
Provided is a nonwoven fabric substrate () in which ridges () and grooves () are alternately formed at positions corresponding to each other on each of both surfaces (), and apertures () penetrating the grooves () of both surfaces are formed. The ridges () and the grooves () extend parallel to each other. The ridges () and the grooves () extend in a direction intersecting with each of a pair of both sides () extending in parallel of the nonwoven fabric substrate (). In planar view, each of the grooves () alternately includes an aperture portion () which has a plurality of the apertures (), and a non-aperture portion which has no aperture () and is longer than a distance between the nearest end portions of the adjacent apertures () in the aperture portion (), and arrangement patterns of the aperture portion () and the non-aperture portion () provided in the adjacent grooves () are different from each other. When the nonwoven fabric substrate () is seen in planar view, the nonwoven fabric substrate () has an aperture region () formed by the aperture portion () of the plurality of grooves (), and a non-aperture region () formed by the non-aperture portion (), and the aperture region () and the non-aperture region () are arranged in a predetermined pattern.