The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
May. 21, 2015
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Jérôme Belledent, Meylan, FR;
Patricia Pimenta Barros, Grenoble, FR;
Abstract
A method for making patterns includes forming on a substrate surface a first mask delimiting at least two areas to be metallised; forming an assembly guide above the first mask, the assembly guide delimiting a surface covering two contact areas belonging respectively to the two areas to be metallised; depositing on the surface a block copolymer layer; reorganising the block copolymer layer; eliminating one of the phases of the reorganised block copolymer layer, resulting in a plurality of holes extending into the block copolymer layer above the two contact areas and a portion of the first mask arranged between the two contact areas; widening the holes of the block copolymer layer until a continuous trench is formed above the two contact areas and the portion of the first mask; transferring, through the first mask, the continuous trench onto the surface of the substrate to form patterns corresponding to the contact areas.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile