The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Dec. 06, 2014
Dh Technologies Development Pte. Ltd., Singapore, SG;
Mircea Guna, Toronto, CA;
DH Technologies Development Pte. Ltd., Singapore, SG;
Abstract
Systems and methods are provided for performing multiplex electrostatic linear ion trap mass spectrometry. A first beam of ions is received and the first beam is split into N beams of ions using a beam splitter. N is two or more. Ions are received from only one of the N beams of ions at each entrance aperture of N entrance apertures of an electrostatic linear ion trap (ELIT). Ions from each entrance aperture of the N entrance apertures are trapped in separate linear flight paths using the ELIT, producing N separate linear flight paths. Ion oscillations in the N separate linear flight paths are measured at substantially the same time using the ELIT. The ELIT uses two concentric mirrors with N apertures to trap ions in the N separate linear flight paths. The ELIT uses an image current detector with N apertures to the measure the ion oscillations.