The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2017

Filed:

Sep. 30, 2014
Applicant:

Spectra Systems Corporation, Providence, RI (US);

Inventors:

Nabil Lawandy, Saunderstown, RI (US);

Paul Byrne, Warwick, RI (US);

Assignee:

Spectra Systems Corporation, Providence, RI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 26/00 (2006.01); D21H 25/06 (2006.01); D21H 25/00 (2006.01); D21H 21/40 (2006.01); D21H 17/00 (2006.01); D21H 17/06 (2006.01); D21H 17/36 (2006.01);
U.S. Cl.
CPC ...
D21H 25/06 (2013.01); D21H 17/06 (2013.01); D21H 17/36 (2013.01); D21H 17/72 (2013.01); D21H 21/40 (2013.01); D21H 25/005 (2013.01);
Abstract

A method for enhancing the structural strength of a porous substrate having pores therein is disclosed. The method includes soaking the porous substrate in a solution having a first solvent and at least one polymer dissolved in the first solvent at a specific temperature and pressure, such that the solution is deposited within pores of the porous substrate, soaking the porous substrate in a second solvent, such that the first solvent diffuses into the second solvent, and such that the at least one polymer remains within the pores of the porous substrate, and flushing out the second solvent from the porous substrate.


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