The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Dec. 18, 2014
Applicant:
E I Du Pont DE Nemours and Company, Wilmington, DE (US);
Inventor:
Richard T Chou, Hockessin, DE (US);
Assignee:
E. I. DU PONT DE NEMOURS AND COMPANY, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/32 (2006.01); B32B 27/30 (2006.01); B32B 27/28 (2006.01); B32B 27/06 (2006.01); B32B 9/00 (2006.01); B32B 27/34 (2006.01); C08L 23/08 (2006.01); C09D 123/08 (2006.01);
U.S. Cl.
CPC ...
C09D 123/0869 (2013.01); B32B 9/00 (2013.01); B32B 27/06 (2013.01); B32B 27/28 (2013.01); B32B 27/286 (2013.01); B32B 27/30 (2013.01); B32B 27/306 (2013.01); B32B 27/308 (2013.01); B32B 27/32 (2013.01); B32B 27/34 (2013.01); C08L 23/0869 (2013.01); B32B 2307/00 (2013.01); B32B 2307/21 (2013.01); C08L 2201/04 (2013.01); Y10T 428/3175 (2015.04); Y10T 428/31721 (2015.04); Y10T 428/31797 (2015.04); Y10T 428/31935 (2015.04);
Abstract
Disclosed is an antistatic composition comprising a base resin comprising polyethylene or ethylene copolymers, an ethylene copolymer comprising amine-reactive sites and a polyetheramine and articles thereof. The ethylene copolymer comprising amine-reactive sites and the polyetheramine react to provide a graft copolymer.