The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2017

Filed:

Jul. 15, 2015
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Hiroaki Kida, Shiojiri, JP;

Hiroshi Fukumoto, Shiojiri, JP;

Toru Saito, Yamagata, JP;

Keitaro Nakano, Matsumoto, JP;

Hiroki Nakane, Matsumoto, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/21 (2006.01); C09D 11/101 (2014.01); C08K 3/00 (2006.01); C09D 11/322 (2014.01); C09D 11/38 (2014.01); B41J 11/00 (2006.01);
U.S. Cl.
CPC ...
C09D 11/101 (2013.01); B41J 2/2107 (2013.01); C08K 3/0033 (2013.01); C09D 11/322 (2013.01); C09D 11/38 (2013.01); B41J 11/002 (2013.01);
Abstract

The present invention provides a photocurable ink composition for ink jet recording with excellent curability. The photocurable ink composition for ink jet recording includes polymerizable compounds, a photopolymerization initiator, and a colorant, wherein the polymerizable compounds include a vinyl ether group-containing (meth)acrylate represented by general formula (I):CH═CR—COOR—O—CH═CH—R  (I)(wherein Ris a hydrogen atom or a methyl group, Ris a divalent organic residue having 2 to 20 carbon atoms, and Ris a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms) and phenoxyethyl (meth)acrylate.


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