The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Jun. 12, 2015
Applicant:
L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;
Inventors:
Jean-Marc Girard, Versailles, FR;
Peng Zhang, Montvale, NJ (US);
Antonio Sanchez, Jersey City, NJ (US);
Manish Khandelwal, Somerset, NJ (US);
Gennadiy Itov, Flemington, NJ (US);
Reno Pesaresi, Easton, PA (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 21/087 (2006.01); C23C 16/30 (2006.01); C07F 7/02 (2006.01); C01B 21/088 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/515 (2006.01);
U.S. Cl.
CPC ...
C07F 7/025 (2013.01); C01B 21/087 (2013.01); C01B 21/088 (2013.01); C23C 16/308 (2013.01); C23C 16/345 (2013.01); C23C 16/402 (2013.01); C23C 16/45553 (2013.01); C23C 16/515 (2013.01);
Abstract
Mono-substituted TSA precursor Si-containing film forming compositions are disclosed. The precursors have the formula: (SiH)N—SiH—X, wherein X is selected from a halogen atom; an isocyanato group; an amino group; an N-containing C-Csaturated or unsaturated heterocycle; or an alkoxy group. Methods for forming the Si-containing film using the disclosed mono-substituted TSA precursor are also disclosed.