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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9776876 B1

PDFFull Text
Expired
Date of Patent:
Oct. 03, 2017

Filed:

Oct. 30, 2015

Chunk polycrystalline silicon and process for cleaning polycrystalline silicon chunks

Applicant:

Wacker Chemie Ag, Munich, DE;

Inventors:

Gerhard Traunspurger, Berchtesgaden, DE;

Laszlo Fabry, Burghausen, DE;

Reiner Pech, Neuoetting, DE;

Assignee:

WACKER CHEMIE AG, Munich, DE;

Attorney:

Caesar Rivise, PC

Primary Examiner:

Anthony J Zimmer

Int. Cl.
CPC ...
C01B 33/02 (2006.01); H01L 21/02 (2006.01); C01B 33/03 (2006.01); C30B 11/00 (2006.01); C30B 13/00 (2006.01); B30B 15/00 (2006.01); C30B 29/06 (2006.01); C01B 33/037 (2006.01); C30B 15/00 (2006.01);
U.S. Cl.
CPC ...
C01B 33/02 (2013.01); C01B 33/037 (2013.01); C30B 11/00 (2013.01); C30B 13/00 (2013.01); C30B 15/00 (2013.01); C30B 29/06 (2013.01); H01L 21/02046 (2013.01); C01P 2002/88 (2013.01); C01P 2002/89 (2013.01); C01P 2002/90 (2013.01); C01P 2006/80 (2013.01);
Abstract

The invention provides chunk polycrystalline silicon having a concentration of carbon at the surface of 0.5-35 ppbw. A process for cleaning polycrystalline silicon chunks having carbon contaminations at the surface, includes a thermal treatment of the polycrystalline silicon chunks in a reactor at a temperature of 350 to 600° C., the polycrystalline silicon chunks being present in an inert gas atmosphere during the thermal treatment, and the polycrystalline silicon chunks after the thermal treatment having a concentration of carbon at the surface of 0.5-35 ppbw.

Find Patent Forward Citations

Traunspurger, Gerhard. (2017). Chunk polycrystalline silicon and process for cleaning polycrystalline silicon chunks (U.S. Patent No. 9776876). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9776876

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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