The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Jan. 02, 2015
Applicant:
Canatu Oy, Espoo, FI;
Inventors:
David P. Brown, Espoo, FI;
Albert G. Nasibulin, Espoo, FI;
Esko I. Kauppinen, Helsinki, FI;
David Gonzales, Helsinki, FI;
Assignee:
CANATU OY, Espoo, FI;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); B82Y 30/00 (2011.01); B05D 1/04 (2006.01); B82B 3/00 (2006.01); C01B 31/02 (2006.01);
U.S. Cl.
CPC ...
B05D 1/04 (2013.01); B82B 3/00 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 31/0206 (2013.01); Y10S 977/742 (2013.01); Y10S 977/84 (2013.01); Y10S 977/842 (2013.01); Y10S 977/845 (2013.01);
Abstract
A method for depositing high aspect ratio molecular structures (HARMS), which method comprises applying a force upon an aerosol comprising one or more HARM-structures, which force moves one or more HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations for depositing one or more HARM-structures in a pattern by means of an applied force.