The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2017

Filed:

Aug. 05, 2015
Applicant:

Uchicago Argonne, Llc, Chicago, IL (US);

Inventors:

Alex B. Martinson, Naperville, IL (US);

In Soo Kim, Woodridge, IL (US);

Assignee:

UCHICAGO ARGONNE, LLC, Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 51/44 (2006.01); H01L 31/032 (2006.01); H01L 31/0216 (2014.01); H01L 31/0256 (2006.01);
U.S. Cl.
CPC ...
H01L 51/448 (2013.01); H01L 31/02167 (2013.01); H01L 31/032 (2013.01); H01L 2031/0344 (2013.01); Y02E 10/549 (2013.01);
Abstract

A method of protecting a perovskite halide film from moisture and temperature includes positioning the perovskite halide film in a chamber. The chamber is maintained at a temperature of less than 200 degrees Celsius. An organo-metal compound is inserted into the chamber. A non-hydrolytic oxygen source is subsequently inserted into the chamber. The inserting of the organo-metal compound and subsequent inserting of the non-hydrolytic oxygen source into the chamber is repeated for a predetermined number of cycles. The non-hydrolytic oxygen source and the organo-metal compound interact in the chamber to deposit a non-hydrolytic metal oxide film on perovskite halide film. The non-hydrolytic metal oxide film protects the perovskite halide film from relative humidity of greater than 35% and a temperature of greater than 150 degrees Celsius, respectively.


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