The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2017

Filed:

Dec. 09, 2016
Applicant:

Dpix, Llc, Colorado Springs, CO (US);

Inventors:

Jerome David Crocco, Colorado Springs, CO (US);

Geun Jo Han, Colorado Springs, CO (US);

Michael Robert Johnson, Colorado Springs, CO (US);

Assignee:

dpiX, LLC, Colorado Springs, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 21/66 (2006.01); H01L 31/0224 (2006.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14698 (2013.01); H01L 22/20 (2013.01); H01L 27/14603 (2013.01); H01L 27/14692 (2013.01); G02F 1/136259 (2013.01); G02F 2001/136263 (2013.01); H01L 31/022408 (2013.01); H01L 31/022475 (2013.01); H01L 31/022483 (2013.01);
Abstract

A method of manufacturing an sensor array includes providing a glass substrate; forming a bottom electrode layer over the glass substrate; forming a sensor material layer over the bottom electrode layer; forming a top electrode layer over the sensor material layer; patterning the top electrode layer, the sensor material layer, and the bottom electrode layer using a first photoresist layer to form a plurality of pixels; detecting a defect in the plurality of pixels; and patterning the plurality of pixels using a second photoresist layer. The first photoresist layer includes a plurality of first pixel patterns and the second photoresist layer comprises a plurality of second pixel patterns, and wherein at least one of the second pixel patterns has an area greater than that of a corresponding first pixel pattern.


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