The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2017

Filed:

Jul. 08, 2016
Applicant:

University-industry Foundation (Uif), Yonsei University, Seoul, KR;

Inventors:

Gwan Hyoung Lee, Seoul, KR;

So Jung Kang, Seoul, KR;

Seung Min Lee, Seoul, KR;

Yong Soo Cho, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 14/22 (2006.01); C23C 14/04 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02568 (2013.01); C23C 14/046 (2013.01); C23C 14/22 (2013.01); C23C 14/5806 (2013.01); C23C 14/5866 (2013.01); H01L 21/0242 (2013.01); H01L 21/02381 (2013.01); H01L 21/02614 (2013.01);
Abstract

Provided is a method of forming a transition metal chalcogenide thin-film and the method includes preparing a first substrate having formed thereon a transition metal-containing precursor thin-film; displacing a second substrate separately with a constant distance from the first substrate by using a bridge unit while the second substrate is facing the first substrate, thereby securing a gas flowing path between the first substrate and the second substrate; heating the first and second substrates to a reaction temperature; and introducing a chalcogen-containing gas from an end of a reactor, such that the chalcogen-containing gas flows via the path.


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