The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2017

Filed:

Jan. 20, 2014
Applicant:

Eastman Kodak Company, Rochester, NY (US);

Inventors:

Deepak Shukla, Webster, NY (US);

Mark R. Mis, Rush, NY (US);

Dianne Marie Meyer, Hilton, NY (US);

Assignee:

EASTMAN KODAK COMPANY, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 228/02 (2006.01); G03F 7/038 (2006.01); C08F 2/50 (2006.01); C08F 212/04 (2006.01); A61Q 5/04 (2006.01); A61Q 5/06 (2006.01); A61K 8/81 (2006.01); G03F 7/004 (2006.01); C08F 222/40 (2006.01); C08F 222/04 (2006.01); C08F 226/12 (2006.01); C08F 220/66 (2006.01); C09D 4/00 (2006.01); C08F 212/14 (2006.01); C08F 232/08 (2006.01); C08F 20/70 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); A61K 8/81 (2013.01); A61K 8/8147 (2013.01); A61Q 5/04 (2013.01); A61Q 5/06 (2013.01); C08F 2/50 (2013.01); C08F 212/04 (2013.01); C08F 228/02 (2013.01); G03F 7/0045 (2013.01); C08F 20/70 (2013.01); C08F 212/14 (2013.01); C08F 220/66 (2013.01); C08F 222/04 (2013.01); C08F 222/40 (2013.01); C08F 226/12 (2013.01); C08F 232/08 (2013.01); C08F 2222/402 (2013.01); C08F 2222/404 (2013.01); C08F 2222/406 (2013.01); C08F 2222/408 (2013.01); C09D 4/00 (2013.01); Y02P 20/582 (2015.11);
Abstract

A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.


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