The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2017
Filed:
Oct. 24, 2014
Applicant:
Mitsubishi Chemical Corporation, Tokyo, JP;
Inventors:
Ryo Aizawa, Otake, JP;
Takeshi Matsuo, Otake, JP;
Naoshi Murata, Otake, JP;
Hiroyuki Mori, Otake, JP;
Assignee:
Mitsubishi Chemical Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07C 57/42 (2006.01); C07C 67/11 (2006.01); C07C 67/62 (2006.01); C07C 67/10 (2006.01);
U.S. Cl.
CPC ...
C07C 57/42 (2013.01); C07C 67/10 (2013.01); C07C 67/11 (2013.01); C07C 67/62 (2013.01);
Abstract
Provided is a method that can produce phenyl(meth)acrylate inexpensively and at high yields. The phenyl(meth)acrylate production method of the present invention reacts (meth)acrylic acid with carbonic acid diphenyl. Further, the phenyl(meth)acyrlate composition of the present invention contains 90-99.999 wt % phenyl(meth)acrylate and 0.001-10% carbonic acid diphenyl. Or, the phenyl(meth)acrylate composition of the present invention contains 90-99.999 wt % phenyl(meth)acrylate and 0.001-10 wt % of a specified compound.