The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2017

Filed:

Mar. 17, 2016
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Lee Alan Stringer, McKinney, TX (US);

Mona Eissa, Allen, TX (US);

Byron J. R. Shulver, Richardson, TX (US);

Sopa Chevacharoenkul, Richardson, TX (US);

Mark R. Kimmich, Frisco, TX (US);

Sudtida Lavangkul, Richardson, TX (US);

Mark L. Jenson, Allen, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/04 (2006.01); B81C 1/00 (2006.01); G01R 33/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00825 (2013.01); G01R 33/0047 (2013.01); G01R 33/04 (2013.01); B81C 2201/014 (2013.01); B81C 2201/0138 (2013.01);
Abstract

A method comprises forming an etch stop layer, a first titanium layer, a magnetic core, a second titanium layer, and patterning the first and second titanium layers. The etch stop layer is formed above a substrate. The first titanium layer is formed on the etch stop layer. The magnetic core is formed on the first titanium layer. The second titanium layer has a first portion encapsulating the magnetic core with the first titanium layer, and a second portion interfacing with the first titanium layer beyond the magnetic core. The patterning of the first and second titanium layers includes forming a mask over a magnetic core region and etching the first and second titanium layers exposed by the mask using a titanium etchant and a titanium oxide etchant.


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