The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Jun. 19, 2015
Applicants:

Doo-young Lee, Seoul, KR;

Sang-hyun Lee, Seoul, KR;

Myung-hoon Jung, Yongin-si, KR;

Do-hyoung Kim, Hwaseong-si, KR;

Inventors:

Doo-Young Lee, Seoul, KR;

Sang-Hyun Lee, Seoul, KR;

Myung-Hoon Jung, Yongin-si, KR;

Do-Hyoung Kim, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 29/45 (2006.01); H01L 21/768 (2006.01); H01L 21/28 (2006.01); H01L 29/417 (2006.01); H01L 29/78 (2006.01); H01L 21/8234 (2006.01); H01L 27/02 (2006.01); H01L 27/11 (2006.01);
U.S. Cl.
CPC ...
H01L 27/088 (2013.01); H01L 21/28114 (2013.01); H01L 21/76804 (2013.01); H01L 21/76843 (2013.01); H01L 29/41775 (2013.01); H01L 29/45 (2013.01); H01L 21/823425 (2013.01); H01L 21/823475 (2013.01); H01L 27/0207 (2013.01); H01L 27/0886 (2013.01); H01L 27/1104 (2013.01); H01L 29/41758 (2013.01); H01L 29/78 (2013.01);
Abstract

A semiconductor device includes a first gate pattern and a second gate pattern on a substrate, the first gate pattern having a first height and the second gate pattern having a second height, an insulating pattern on the substrate covering the first and second gate patterns, the insulating pattern including a trench exposing the substrate between the first and second gate patterns, a spacer contacting at least a portion of a sidewall of the insulating pattern within the trench, the spacer spaced apart from the first and second gate patterns and having a third height larger than the first and second heights, and a contact structure filling the trench.


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