The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
Apr. 30, 2015
Applicant:
Skyworks Solutions, Inc., Woburn, MA (US);
Inventor:
Kezia Cheng, Lowell, MA (US);
Assignee:
SKYWORKS SOLUTIONS, INC., Woburn, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01J 37/304 (2006.01); H01J 37/305 (2006.01); G01N 27/00 (2006.01); H01L 21/02 (2006.01); C23C 14/30 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
H01L 22/14 (2013.01); C23C 14/30 (2013.01); C23C 14/548 (2013.01); G01N 27/00 (2013.01); H01J 37/304 (2013.01); H01J 37/3053 (2013.01); H01L 21/02 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/30472 (2013.01); H01J 2237/3132 (2013.01); Y10T 29/41 (2015.01);
Abstract
An electrode system configured to be positioned within a vacuum chamber of an electron-beam metal evaporation and deposition apparatus including a metal slug from which metal is evaporated during operation of the electron-beam metal evaporation and deposition apparatus. The electrode system includes a substantially ring-shaped electrode formed of a conductive material and a plurality of insulating standoffs configured to support the substantially ring-shaped electrode in the vacuum chamber in a position substantially surrounding the metal slug.