The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Nov. 18, 2014
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Yucheng Liu, West Lafayette, IN (US);

Buyue Zhang, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 3/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0028 (2013.01); G06T 3/0012 (2013.01);
Abstract

A method, apparatus and a surround view camera system for determining the optimal seam for a surround view camera system. The method includes determining the corrected side view image at bird-eye perspective, generating a cost map for overlapping region, finding a minimum cost seam for each overlapping region, computing weight based on distance to the seam, if blending of the pixel, and blending the pixel, synthesizing composite view, and generating a composite view image.


Find Patent Forward Citations

Liu, Yucheng. (2017). Method and apparatus for a optimal seam for surround view synthesis (U.S. Patent No. 9767561). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9767561

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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