The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
Jun. 13, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Bunsuke Takeshita, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an exposure apparatus including a projection optical system configured to project light from a reticle onto a substrate, a processor configured to estimate a variation in imaging characteristic of the projection optical system, based on a model determined in advance, and an adjusting device configured to adjust the imaging characteristic of the projection optical system based on the variation estimated by the processor, wherein the processor is configured, if an error of the imaging characteristic of the projection optical system adjusted by the adjusting device based on the variation which is estimated based on a first number of models, for estimating the variation, determined in advance without the reticle, does not fall within a tolerance, to generate a second number of models for estimating the variation, the second number being larger than the first number.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile