The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Apr. 05, 2016
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Karim Hassan, Voiron, FR;

Corrado Sciancalepore, Grenoble, FR;

Badhise Ben Bakir, Brezins, FR;

Sylvie Menezo, Voiron, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/134 (2006.01); G02B 6/12 (2006.01); G02B 6/122 (2006.01); G02B 6/136 (2006.01); G02F 1/225 (2006.01); G02F 1/21 (2006.01);
U.S. Cl.
CPC ...
G02B 6/1347 (2013.01); G02B 6/1228 (2013.01); G02B 6/136 (2013.01); G02F 1/2257 (2013.01); G02B 6/12011 (2013.01); G02B 2006/12035 (2013.01); G02B 2006/12097 (2013.01); G02B 2006/12159 (2013.01); G02F 2001/212 (2013.01);
Abstract

A method for adjusting the properties of a photonic circuit such that they fit with expected properties, the photonic circuit including a waveguide which includes a light propagation region, is provided. The method includes a step of modifying the refractive index of at least one zone of the region, the step being implemented by an ion implantation in the at least one zone. It extends to a waveguide the light propagation region of which has at least one zone with a refractive index modified by ion implantation in which the light remains confined, as well as a photonic circuit incorporating such a guide.


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